3M™ CMP Pad Conditioner Brush PB52A, 4.25-in dia

3M ID 60020012542

Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads

Durable brush bristles assist with removal of pad debris from porometric and felt-based pads

Metal-free, polymer bristles resist corrosion

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Highlights

Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads
Durable brush bristles assist with removal of pad debris from porometric and felt-based pads
Metal-free, polymer bristles resist corrosion
Durable bristles are independently fixed across the brush surface
3M™ CMP brush connects easily to polishing tool end effector

Engineered specifically for chemical mechanical polishing (CMP) pad cleaning applications, our 3M™ CMP Pad Conditioner Brush is excellent for efficient pad cleaning and slurry distribution which helps manufacturers reduce cost of ownership in semiconductor operations. These 3M CMP brushes are part of a full range of 3M CMP solutions.