3M™ CMP Pad Conditioner Brush PB52A, 4.25-in dia

3M ID 60020012542
  • Exclusive polymer substrate enhances corrosion resistance
  • Durable brush bristles assist with removal of pad debris from porometric and felt-based pads
  • Easy connection to polishing tool end effector
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Details

Engineered CMP pad brushes are designed for critical semiconductor buff CMP applications.

  • Exclusive polymer substrate enhances corrosion resistance
  • Durable brush bristles assist with removal of pad debris from porometric and felt-based pads
  • Easy connection to polishing tool end effector
Specifications
Abrasive Working Surface
Full Face
Applications
CMP
Brand
3M™
Bristle Diameter
0.012 in
Brush Material-Density
Nylon, >1200/sq in
Carrier Colour
Black
Carrier Format
Disk
Carrier Material
Polycarbonate
Carrier Size
4.25 inch diameter
Carrier Substrate
Polycarbonate
CMP Process
Cu (barrier), Final Buff, W (buff)
Manufacturing Location
United States
Mineral Type
Nylon Fibers
Product Series
PB52A
Product Type
Pad Conditioner Brush