- Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads
- Durable brush bristles assist with removal of pad debris from porometric and felt-based pads
- Metal-free, polymer bristles resist corrosion
- Durable bristles are independently fixed across the brush surface
Details
Engineered specifically for chemical mechanical polishing (CMP) pad cleaning applications, our 3M™ CMP Pad Conditioner Brush is excellent for efficient pad cleaning and slurry distribution which helps manufacturers reduce cost of ownership in semiconductor operations. These 3M CMP brushes are part of a full range of 3M CMP solutions.
- Excellent for soft CMP pads, including microreplicated, porometric and felt-based pads
- Durable brush bristles assist with removal of pad debris from porometric and felt-based pads
- Metal-free, polymer bristles resist corrosion
- Durable bristles are independently fixed across the brush surface
- 3M™ CMP brush connects easily to polishing tool end effector
Specifications
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|---|---|
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Abrasive Working Surface
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Full Face
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Applications
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CMP
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Brand
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3M™
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Carrier Material
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Polycarbonate
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CMP Process
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Cu (Barrier), Final Buff, W (Buff)
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Manufacturing Location
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United States
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Mineral Type
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Nylon Fibers
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Product Series
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PB52A
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Product Type
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Pad Conditioner Brush
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