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  6. 3M™ CMP Pad Conditioner Brush PB33A, 4.25 in diameter

3M™ CMP Pad Conditioner Brush PB33A, 4.25 in diameter

3M ID 60020016634
  • Exclusive polymer substrate enhances corrosion resistance
  • Durable brush bristles assist with removal of pad debris from porometric and felt-based pads
  • Easy connection to polishing tool end effector
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Details

Engineered CMP pad brushes are designed for critical semiconductor buff CMP applications.

  • Exclusive polymer substrate enhances corrosion resistance
  • Durable brush bristles assist with removal of pad debris from porometric and felt-based pads
  • Easy connection to polishing tool end effector
Specifications
Abrasive Working Surface
Full Face
Applications
CMP
Brand
3M™
Bristle Diameter
0.005 in
Brush Material-Density
Nylon, >2000/sq in
Carrier Colour
Black
Carrier Format
Disk
Carrier Material
Polycarbonate
Carrier Size
4.25 inch diameter
Carrier Substrate
Polycarbonate
CMP Process
Cu (barrier), Final Buff, W (buff)
Manufacturing Location
United States
Mineral Type
Nylon Fibers
Product Series
PB33A
Product Type
Pad Conditioner Brush